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The 2nd Annual Meeting of
Mask Drawing, Design, and Inspection Technology Research Department

Sponsor
Association of Super-Advanced Electronics Technologies (ASET)
Cosponsor
New Energy and Industrial Technology Development Organization (NEDO)
Date, Time
April 11, 2008, Meeting: 2PM [Tentative] -6:25PM, Reception: 6:30PM
Place
Sohyo Kaikan (Room 203+204) (Kanda-Surugadai, Chiyoda Tokyo)
Shin-ochanomizu station B3 exit (Tokyo Metro, Chiyoda-line)
Ochanomizu station Hiziribashi exit (5 min. walk) (JR East, Chuo & Sobu line)
Registration
This meeting is admission free. However, pre-registration by March 28 is required. If you would like to attend the meeting, please send the following information by e-mail.
Pre-registration will close when the fixed number of pre-registration is reached. There will be no on-site registration.
1. Name (Full name)
2. Affiliation:
3. Department:
4. Job title:
5. Address:
6. Telephone number:
7. E-mail address:
8. I (will/will not) attend the meeting. (Please delete "will" or "will not".)
9. I (will/will not) attend the reception. (Please delete "will" or "will not".)
Contact
Association of Super-Advanced Electronics Technologies (ASET)
Mask Drawing, Design, and Inspection Technology Research Department
Tokyo Dia. Bldg. 1/8F, 1-28-38 Shinkawa, Chuo, Tokyo 104-0033, Japan
TEL: +81 3 3552 4816 (Direct)、4811
FAX: +81 3 3552 4812

Program (Tentative)　　　　　　　　　　
1:30PM
Meeting room opens.
2:00PM
Opening
Invited talk (Dr. Micheal Lercel、Director, Lithography, SEMATECH)
Introduction (Project leader: Prof. Sunao Ishihara, Tokyo Univ.)
Outline of the research
Results from Mask Design Data Tech. Research Lab.
Results from Mask Writing Equipment Tech. Research Lab.
Presentation from joint-research partner (MEIJO Univ.)
Results from Mask Inspection Equipment Tech. Research Lab.
6:25PM
Closing
6:30PM
Reception (Room 201)
Presentaion language is Japanese. Slides and handout will be written in English.
Program will be updated.