The 3rd Annual Meeting of
Mask Design, Drawing, and Inspection Technology Research Department
| Sponsor |
Association of Super-Advanced Electronics Technologies (ASET) |
| Cosponsor |
New Energy and Industrial Technology Development Organization (NEDO) |
| Date, Time |
April 6, 2009, Meeting; 1:30PM-5:35PM [Tentative], Reception; 5:45PM
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| Place |
National Museum of Emerging Science and Innovation (Aomi, Koto Tokyo)
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Tokyo Waterfront New Transit YURIKAMOME
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5 minutes walk from "Fune-no Kagakukans station"
4 minutes walk from "Telecom Center station"
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| Registration |
This meeting is admission free. However, pre-registration by March 23 is required. If you would like to attend the meeting, please send the following information by e-mail.
Pre-registration will close when the fixed number of pre-registration is reached. There will be no on-site registration.
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1. Name (Full name) |
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2. Affiliation; |
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3. Department; |
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4. Job title; |
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5. Address; |
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6. Telephone number; |
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7. E-mail address; |
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8. I (will/will not) attend the meeting. (Please delete "will" or "will not".) |
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9. I (will/will not) attend the reception. (Please delete "will" or "will not".) |
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Contact |
Association of Super-Advanced Electronics Technologies (ASET) |
Mask Design, Drawing, and Inspection Technology Research Department |
Tokyo Dia. Bldg. 1/8F, 1-28-38 Shinkawa, Chuo, Tokyo 104-0033, Japan |
TEL; +81 3 3552 4816 (Direct)、4811 |
FAX; +81 3 3552 4812 |
E-mail; maskd2i_09@aset.tokyoinfo.or.jp |
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Program (Tentative)
| 1:00PM
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Meeting room opens. |
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1:30PM
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Opening |
| Invited presentation - 1
"CRYSTAL project, a contribution to IC Cycle Time excursion control"
Mr. Eric Beisser, Leader of MEDEA+ CRYSTAL Project Work Package WP1 [Mask DFM] and CEO of XYALIS |
| Keynote talk (Project leader) |
| Outline of the research |
| Results from Mask Design Data Tech. Research Lab. |
| Invited presentation - 2
"Current Status of a Development Program for EUVL Mask Technologies at MIRAI-Selete"
Mr. Osamu Suga, Semiconductor Leading Edge Tchnologies, Inc. (Selete),
Program Manager, EUVL Mask Program, Research Dept.3 |
| Results from Mask Inspection Equipment Tech. Research Lab. |
| Results from Mask Writing Equipment Tech. Research Lab. |
| 5:35PM |
Adjourn |
| 5:45PM |
Reception (Sky View Restaurant "Basara" [7th floor]) |
Presentaion language is Japanese.
SLIDES and HANDOUT will be written in "ENGLISH"
Program will be updated.
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