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The 4th Annual Meeting of
Mask Design, Drawing, and Inspection Technology Research Department

Sponsor
Association of Super-Advanced Electronics Technologies (ASET)
Cosponsor
New Energy and Industrial Technology Development Organization (NEDO)
Date, Time
April 15, 2010, Meeting: 1:20PM - 5:25PM [Tentative], Reception: 5:35PM
Place
Pacifico Yokohama (Annex Hall) Yokohama, Japan
3-minute walk from Minato Mirai Station (Minato Mirai Line)
Others
This meeting will be held just after Photomask Japan2010 (Aplil 13-15 (in the morning)) at the same place as Photomask Japan 2010.
Registration
This meeting is admission free. However, pre-registration by March 31 is required. If you would like to attend the meeting, please send the following information by e-mail. Pre-registration will close when the fixed number of pre-registration is reached.
1. Name (Full name)
2. Affiliation;
3. Department;
4. Job title;
5. Address;
6. Telephone number;
7. E-mail address;
8. I (will/will not) attend the meeting. (Please delete "will" or "will not".)
9. I (will/will not) attend the reception. (Please delete "will" or "will not".)
Contact
Association of Super-Advanced Electronics Technologies (ASET)
Mask Design, Drawing, and Inspection Technology Research Department
Tokyo Dia. Bldg. 1/8F, 1-28-38 Shinkawa, Chuo, Tokyo 104-0033, Japan
TEL; +81 3 3552 4816 (Direct)、4811
FAX; +81 3 3552 4812
E-mail; maskd2i_10@aset.tokyoinfo.or.jp

Program (Tentative)　　　　　　　　　　
 
Opening
 
Invited presentation
(Mr. Naoya Hayashi: Research Fellow, Dai Nippon Printing Co. Ltd.)
 
Introduction of Mask-D2I
(Project leader, Prof. Sunao Ishihara, the University of Tokyo, Graduate School)
 
Outline of the research
(Mr. Masaki Yamabe, General Manager, ASET)
 
Mask Data Rank (MDR) and its application
(Mr. Tadao Inoue, Manager, ASET)
 
Repeating pattern (CP) extraction and its application
(Mr. Masahiro Shoji, Principal Researcher, ASET)
 
Parallel writing system MCC (Multi Column Cell)
(Dr. Akio Yamada, Manager, ASET)
 
Monitor and self-diagnostics system of mask writer
(Mr. Hiromichi Hoshi, Senior Researcher, ASET)
 
Printability verification system in mask inspection
(Mr. Kenichi Takahara, Manager, ASET)
 
Reception
Presentation language is Japanese.
SLIDES and HANDOUT will be written in "ENGLISH" in "DETAIL"
Program will be updated.